发明申请
US20060266983A1 Inhibitor particles, method of production of same, electrode paste, method of production of electronic device 审中-公开
抑制剂颗粒,生产方法,电极糊,电子装置的生产方法

  • 专利标题: Inhibitor particles, method of production of same, electrode paste, method of production of electronic device
  • 专利标题(中): 抑制剂颗粒,生产方法,电极糊,电子装置的生产方法
  • 申请号: US11407265
    申请日: 2006-04-20
  • 公开(公告)号: US20060266983A1
    公开(公告)日: 2006-11-30
  • 发明人: Kazutaka SuzukiShigeki Sato
  • 申请人: Kazutaka SuzukiShigeki Sato
  • 申请人地址: JP Tokyo
  • 专利权人: TDK Corporation
  • 当前专利权人: TDK Corporation
  • 当前专利权人地址: JP Tokyo
  • 优先权: JP2005-124041 20050421; JP2006-059954 20060306
  • 主分类号: H01B1/12
  • IPC分类号: H01B1/12
Inhibitor particles, method of production of same, electrode paste, method of production of electronic device
摘要:
Inhibitor particles, contained in an electrode paste for forming electrodes so as to suppress spheroidization of conductive particles contained in the electrode paste in a firing process, each particle having a core part formed by a dielectric particle and a covering layer covering around the core part, the covering layer formed by a precious metal. The precious metal is comprised of a metal or alloy having at least one element selected from ruthenium (Ru), rhodium (Rh), rhenium (Re), platinum (Pt), iridium (Ir), and osmium (Os) as a main ingredient.
信息查询
0/0