发明申请
- 专利标题： Method for analysis of objects in microlithography
- 专利标题（中）： 微光刻中物体分析方法
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申请号： US10564282申请日： 2004-07-03
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公开(公告)号： US20060269117A1公开(公告)日： 2006-11-30
- 发明人: Holger Seitz , Roman Windpassinger
- 申请人： Holger Seitz , Roman Windpassinger
- 优先权： DE10332059.8 20030711
- 国际申请： PCT/EP04/07267 WO 20040703
- 主分类号： G06K9/00
- IPC分类号： G06K9/00
摘要：
A method for analysis of an object in microlithography. The steps of the method include providing an aerial image measurement system (AIMS) that consists of at least two imaging steps; detecting the image output of the AIMS; and employing a correction filter to correct the detected image with respect to the transfer behavior of the second or other imaging steps. An AIMS apparatus to carry out the method is also defined.
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