发明申请
US20060275672A1 Photomask with controllable patterns 审中-公开
具有可控图案的光掩模

Photomask with controllable patterns
摘要:
A photomask with controllable patterns is a panel, which can be controlled to change the shading patterns. The panel is composed of a plurality of optical controlled elements and has various portions of transparent, gray-scale or opaque patterns by controlling the optical controlled elements. When light passes through the photomask, the arrangement of the transparent, semiopaque, and opaque optical controlled elements forms the shading patterns, and these are exposure patterns in the exposure process.
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