发明申请
- 专利标题: Photomask with controllable patterns
- 专利标题(中): 具有可控图案的光掩模
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申请号: US11144821申请日: 2005-06-06
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公开(公告)号: US20060275672A1公开(公告)日: 2006-12-07
- 发明人: Chien-Chung Kuo , Chin-Chang Liu
- 申请人: Chien-Chung Kuo , Chin-Chang Liu
- 专利权人: WINTEK CORPORATION
- 当前专利权人: WINTEK CORPORATION
- 主分类号: G03F1/00
- IPC分类号: G03F1/00
摘要:
A photomask with controllable patterns is a panel, which can be controlled to change the shading patterns. The panel is composed of a plurality of optical controlled elements and has various portions of transparent, gray-scale or opaque patterns by controlling the optical controlled elements. When light passes through the photomask, the arrangement of the transparent, semiopaque, and opaque optical controlled elements forms the shading patterns, and these are exposure patterns in the exposure process.
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