发明申请
US20060285050A1 Thin film transistor of fringe field switching type and fabricating method thereof 有权
边缘场开关型薄膜晶体管及其制造方法

  • 专利标题: Thin film transistor of fringe field switching type and fabricating method thereof
  • 专利标题(中): 边缘场开关型薄膜晶体管及其制造方法
  • 申请号: US11256092
    申请日: 2005-10-24
  • 公开(公告)号: US20060285050A1
    公开(公告)日: 2006-12-21
  • 发明人: Soon YooYoun ChangHeung Cho
  • 申请人: Soon YooYoun ChangHeung Cho
  • 优先权: KRP2005-053123 20050620
  • 主分类号: G02F1/1343
  • IPC分类号: G02F1/1343
Thin film transistor of fringe field switching type and fabricating method thereof
摘要:
A fringe field switching type thin film transistor substrate includes a double layered structure gate line; a data line crossing the gate line, wherein a gate insulating film is formed therebetween; a thin film transistor having a gate electrode connected to the gate line, a source electrode connected to the data line, and a drain electrode opposing the source electrode; a double layered structure common line parallel to the gate line; a common electrode plate integrated with the transparent conductive layer of the common line and formed in a pixel area defined by the crossing of the gate line and the data line; a pixel electrode slit covering the drain electrode of the thin film transistor and overlapping the common electrode plate, wherein the gate insulating film is formed therebetween in the pixel area; and a data protection pattern covering the data line and the source electrode.
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