发明申请
- 专利标题: Thin film transistor of fringe field switching type and fabricating method thereof
- 专利标题(中): 边缘场开关型薄膜晶体管及其制造方法
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申请号: US11256092申请日: 2005-10-24
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公开(公告)号: US20060285050A1公开(公告)日: 2006-12-21
- 发明人: Soon Yoo , Youn Chang , Heung Cho
- 申请人: Soon Yoo , Youn Chang , Heung Cho
- 优先权: KRP2005-053123 20050620
- 主分类号: G02F1/1343
- IPC分类号: G02F1/1343
摘要:
A fringe field switching type thin film transistor substrate includes a double layered structure gate line; a data line crossing the gate line, wherein a gate insulating film is formed therebetween; a thin film transistor having a gate electrode connected to the gate line, a source electrode connected to the data line, and a drain electrode opposing the source electrode; a double layered structure common line parallel to the gate line; a common electrode plate integrated with the transparent conductive layer of the common line and formed in a pixel area defined by the crossing of the gate line and the data line; a pixel electrode slit covering the drain electrode of the thin film transistor and overlapping the common electrode plate, wherein the gate insulating film is formed therebetween in the pixel area; and a data protection pattern covering the data line and the source electrode.
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