发明申请
- 专利标题： Nitrogen-containing organosilicon compound, method of manufacture, and method of treating surfaces
- 专利标题（中）： 含氮有机硅化合物，制造方法和表面处理方法
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申请号： US10551528申请日： 2004-03-30
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公开(公告)号： US20060287546A1公开(公告)日： 2006-12-21
- 发明人: Makoto Iwai , Mitsuyoshi Hamada
- 申请人： Makoto Iwai , Mitsuyoshi Hamada
- 优先权： JP2003-093337 20030331
- 国际申请： PCT/JP04/04562 WO 20040330
- 主分类号： C07F7/10
- IPC分类号： C07F7/10
摘要：
A new nitrogen-containing organosilicon compound contains tertiary amine groups and carbonyl groups wherein the tertiary amine groups are selected from R1R2N—(where R1 and R2 are the same or different univalent hydrocarbon groups of 1-15 carbon atoms), alicyclic amino groups, or heterocyclic amino groups containing in their rings one or more tertiary amine groups.
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