发明申请
- 专利标题： Composition form forming anti-reflective coating for use in lithography
- 专利标题（中）： 用于光刻的组合物形成抗反射涂层
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申请号： US10530349申请日： 2003-10-08
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公开(公告)号： US20060290429A1公开(公告)日： 2006-12-28
- 发明人: Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Kanayama , Yasuo Kawamura
- 申请人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Kanayama , Yasuo Kawamura
- 申请人地址： JP Tokyo 101-0054
- 专利权人： Nissan Chemical Industries, Ltd.
- 当前专利权人： Nissan Chemical Industries, Ltd.
- 当前专利权人地址： JP Tokyo 101-0054
- 优先权： JP2002-295777 20021009; JP2003-126886 20030502
- 国际申请： PCT/JP03/12875 WO 20031008
- 主分类号： H03F1/14
- IPC分类号： H03F1/14
摘要：
There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.