发明申请
US20060292853A1 Method for fabricating an integrated semiconductor circuit and semiconductor circuit
审中-公开
用于制造集成半导体电路和半导体电路的方法
- 专利标题: Method for fabricating an integrated semiconductor circuit and semiconductor circuit
- 专利标题(中): 用于制造集成半导体电路和半导体电路的方法
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申请号: US11158318申请日: 2005-06-22
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公开(公告)号: US20060292853A1公开(公告)日: 2006-12-28
- 发明人: Rory Dickman
- 申请人: Rory Dickman
- 申请人地址: DE Munich
- 专利权人: INFINEON TECHNOLOGIES AG
- 当前专利权人: INFINEON TECHNOLOGIES AG
- 当前专利权人地址: DE Munich
- 主分类号: H01L21/4763
- IPC分类号: H01L21/4763
摘要:
The present invention relates to a method for fabricating an integrated semiconductor circuit having a conductor structure buried in a semiconductor substrate, and to an integrated semiconductor circuit, in which case the integrated semiconductor circuit may be an application specific semiconductor circuit or a semiconductor circuit that can be adapted for an application.
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