发明申请
- 专利标题: Modulated reflectance measurement system using UV probe
- 专利标题(中): 使用紫外探测器的调制反射测量系统
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申请号: US11520512申请日: 2006-09-13
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公开(公告)号: US20070008541A1公开(公告)日: 2007-01-11
- 发明人: Jon Opsal , Lena Nicolaides , Alex Salnik , Allan Rosencwaig
- 申请人: Jon Opsal , Lena Nicolaides , Alex Salnik , Allan Rosencwaig
- 主分类号: G01N21/55
- IPC分类号: G01N21/55
摘要:
A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.
公开/授权文献
- US07362441B2 Modulated reflectance measurement system using UV probe 公开/授权日:2008-04-22
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