发明申请
- 专利标题： Systems, masks, and methods for manufacturable masks
- 专利标题（中）： 用于制造面罩的系统，面罩和方法
-
申请号： US11245691申请日： 2005-10-06
-
公开(公告)号： US20070009808A1公开(公告)日： 2007-01-11
- 发明人: Daniel Abrams , David Irby
- 申请人： Daniel Abrams , David Irby
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03C5/00
摘要：
Photomask patterns are represented using contours defined by mask functions or other formats. Given target pattern, contours may be optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimized patterns or blocks may be simplified for mask manufacturing.
公开/授权文献
信息查询
