发明申请
- 专利标题： Stage apparatus, lithographic apparatus and device manufacturing method
- 专利标题（中）： 舞台装置，光刻装置及装置的制造方法
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申请号： US11486378申请日： 2006-07-14
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公开(公告)号： US20070013885A1公开(公告)日： 2007-01-18
- 发明人: Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
- 申请人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
In order to improve the productivity of a lithographic apparatus, a stage apparatus to hold two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.
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