发明申请
- 专利标题： Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light
- 专利标题（中）： 用于改变照明场中的光的强度分布而不会使光的远心变形的方法
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申请号： US11523695申请日： 2006-09-20
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公开(公告)号： US20070013891A1公开(公告)日： 2007-01-18
- 发明人: Stephen Roux , Erik Loopstra , Michael Nelson
- 申请人： Stephen Roux , Erik Loopstra , Michael Nelson
- 申请人地址： NL Veldhoven
- 专利权人： ASML Holding N.V.
- 当前专利权人： ASML Holding N.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/72
- IPC分类号： G03B27/72
摘要：
An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.
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