发明申请
- 专利标题： Photosensitive composition, photosensitive lithography plate and method for producing lithography plate
- 专利标题（中）： 光敏组合物，感光光刻板和光刻板的制造方法
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申请号： US10558505申请日： 2004-05-31
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公开(公告)号： US20070020555A1公开(公告)日： 2007-01-25
- 发明人: Toshiyuki Matsumura , Norio Miura
- 申请人： Toshiyuki Matsumura , Norio Miura
- 优先权： JP2003-157801 20030603; JP2003319531 20030911
- 国际申请： PCT/JP04/07861 WO 20040531
- 主分类号： G03C1/00
- IPC分类号： G03C1/00
摘要：
Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.