发明申请
US20070021580A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film
有权
聚合物,聚合物,绝缘膜形成用组合物,绝缘膜的制造方法以及绝缘膜的制造方法
- 专利标题: Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film
- 专利标题(中): 聚合物,聚合物,绝缘膜形成用组合物,绝缘膜的制造方法以及绝缘膜的制造方法
-
申请号: US11485508申请日: 2006-07-13
-
公开(公告)号: US20070021580A1公开(公告)日: 2007-01-25
- 发明人: Hisashi Nakagawa , Masahiro Akiyama , Takahiko Kurosawa , Atsushi Shiota
- 申请人: Hisashi Nakagawa , Masahiro Akiyama , Takahiko Kurosawa , Atsushi Shiota
- 申请人地址: JP Tokyo
- 专利权人: JSR Corporation
- 当前专利权人: JSR Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2004-9205 20040116
- 主分类号: C08G77/60
- IPC分类号: C08G77/60
摘要:
A method of producing a polymer includes hydrolyzing and condensing a hydrolyzable-group-containing silane monomer (B) in the presence of one or more polycarbosilanes (A), at least one of the polycarbosilanes (A) being a polycarbosilane (I) having a weight average molecular weight of 500 or more and obtained by reacting a compound of the following general formula (1) in the presence of at least one of an alkali metal and an alkaline earth metal, R1mY3-mSiCR2nX3-n (1) wherein R1 and R2 individually represent a monovalent organic group or a hydrogen atom, X represents a halogen atom, Y represents a halogen atom or an alkoxy group, and m and n individually represent integers from 0 to 2.