发明申请
- 专利标题： Resist protective coating material and patterning process
- 专利标题（中）： 抵抗保护涂料和图案化过程
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申请号： US11492957申请日： 2006-07-26
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公开(公告)号： US20070026341A1公开(公告)日： 2007-02-01
- 发明人: Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masayuki Endo , Masaru Sasago , Haruhiko Komoriya , Michitaka Ootani , Satoru Miyazawa , Kazuhiko Maeda
- 申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masayuki Endo , Masaru Sasago , Haruhiko Komoriya , Michitaka Ootani , Satoru Miyazawa , Kazuhiko Maeda
- 申请人地址： JP Chiyoda-ku JP Kadoma-shi JP Ube-shi
- 专利权人： SHIN-ETSU CHEMICAL CO., LTD.,MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.,CENTRAL GLASS CO., LTD.
- 当前专利权人： SHIN-ETSU CHEMICAL CO., LTD.,MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.,CENTRAL GLASS CO., LTD.
- 当前专利权人地址： JP Chiyoda-ku JP Kadoma-shi JP Ube-shi
- 优先权： JP2005-216832 20050727
- 主分类号： G03C1/00
- IPC分类号： G03C1/00
摘要：
A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.
公开/授权文献
- US07569323B2 Resist protective coating material and patterning process 公开/授权日：2009-08-04
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