Invention Application
- Patent Title: Phase change material, phase change random access memory including the same, and methods of manufacturing and operating the same
- Patent Title (中): 相变材料,包括相变的相变随机存取存储器及其制造和操作的方法
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Application No.: US11498796Application Date: 2006-08-04
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Publication No.: US20070029606A1Publication Date: 2007-02-08
- Inventor: Jin-seo Noh , Yoon-ho Khang , Sang-mock Lee , Dong-seok Suh
- Applicant: Jin-seo Noh , Yoon-ho Khang , Sang-mock Lee , Dong-seok Suh
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Priority: KR10-2005-0071482 20050804
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
A phase change material, a PRAM including the same, and methods of manufacturing and operating the same are provided. Insulating impurities may be uniformly distributed over an entire or partial region of the phase change material. The PRAM may include a phase change layer including the phase change material. The insulating impurity content of the phase change material may be 0.1 to 10% (inclusive) the volume of the phase change material. The insulating impurity content of the phase change material may be adjusted by controlling the power applied to a target including the insulating impurities.
Public/Granted literature
Information query
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