发明申请
- 专利标题: Closed region defect detection system
- 专利标题(中): 闭区缺陷检测系统
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申请号: US11584714申请日: 2006-10-19
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公开(公告)号: US20070035727A1公开(公告)日: 2007-02-15
- 发明人: George Chen , Lih-Huah Yiin , Yu Cao
- 申请人: George Chen , Lih-Huah Yiin , Yu Cao
- 申请人地址: US CA San Jose
- 专利权人: KLA-Tencor Corporation
- 当前专利权人: KLA-Tencor Corporation
- 当前专利权人地址: US CA San Jose
- 主分类号: G01N21/88
- IPC分类号: G01N21/88
摘要:
A method and apparatus for inspecting specimens or patterned transmissive substrates, such as photomasks, for unwanted particles and features, particularly those associated with contacts, including irregularly shaped contacts. A specimen is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and/or reflected light collection optics and detectors collect and generate signals representative of the light transmitted by the substrate. The defect identification of the substrate is performed using those transmitted light signals. Defect identification is performed using an inspection algorithm by comparing image feature representations of a test specimen with a reference specimen, and using a boundary computer and flux comparison device to establish tight boundaries around contacts and compute flux differences between the test and reference specimen contacts. Defect sizes are reported as ratio of flux difference, and entire contacts are highlighted for review.
公开/授权文献
- US07499156B2 Closed region defect detection system 公开/授权日:2009-03-03
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