Invention Application
US20070036705A1 Hollow silica particles and methods for making same 审中-公开
中空二氧化硅颗粒及其制备方法

Hollow silica particles and methods for making same
Abstract:
Methods for making hollow silica particle are disclosed, said particles made from a composition comprising a silicon-containing compound selected from the group consisting of tetraalkoxysilanes, trialkyloxysilanes and derivatives thereof, dialkoxysilanes and derivatives thereof, alkoxysilanes and derivatives thereof, silicone oligomers, oligomeric silsesquioxanes and silicone polymers distributed over a polymer template core that is eliminated from the particle. The particles of the present invention have a substantially uniform particle size and exhibit low permeability to liquids.
Information query
Patent Agency Ranking
0/0