Invention Application
- Patent Title: Hollow silica particles and methods for making same
- Patent Title (中): 中空二氧化硅颗粒及其制备方法
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Application No.: US11200917Application Date: 2005-08-10
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Publication No.: US20070036705A1Publication Date: 2007-02-15
- Inventor: Matthew Butts , Sarah Genovese , Paul Glaser , Darryl Williams
- Applicant: Matthew Butts , Sarah Genovese , Paul Glaser , Darryl Williams
- Main IPC: C01B33/12
- IPC: C01B33/12

Abstract:
Methods for making hollow silica particle are disclosed, said particles made from a composition comprising a silicon-containing compound selected from the group consisting of tetraalkoxysilanes, trialkyloxysilanes and derivatives thereof, dialkoxysilanes and derivatives thereof, alkoxysilanes and derivatives thereof, silicone oligomers, oligomeric silsesquioxanes and silicone polymers distributed over a polymer template core that is eliminated from the particle. The particles of the present invention have a substantially uniform particle size and exhibit low permeability to liquids.
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