发明申请
- 专利标题: Anti-Ultraviolet Reflector
- 专利标题(中): 抗紫外线反射器
-
申请号: US11463907申请日: 2006-08-11
-
公开(公告)号: US20070037000A1公开(公告)日: 2007-02-15
- 发明人: Hsi-Hsin Shih , Kuo-Lung Wu , Tien-Chieh Chang , Shih-Kai Cheng , Mao-Song Lee
- 申请人: Hsi-Hsin Shih , Kuo-Lung Wu , Tien-Chieh Chang , Shih-Kai Cheng , Mao-Song Lee
- 申请人地址: TW Tainan County
- 专利权人: CHI LIN TECHNOLOGY CO., LTD.
- 当前专利权人: CHI LIN TECHNOLOGY CO., LTD.
- 当前专利权人地址: TW Tainan County
- 优先权: TW94127631 20050812
- 主分类号: B32B27/00
- IPC分类号: B32B27/00
摘要:
Disclosed is an anti-UV reflector for distributing a light from a point light source or a linear light uniformly over a target. The anti-UV reflector mainly includes a light reflecting polymeric substrate and a protecting layer of anti-UV material provided on the polycarbonate substrate for reducing yellowing in the polycarbonate substrate. When a light from a point light source or a linear light illuminates the anti-UV reflector, UV radiation in the light is filtered or absorbed by the protecting layer thereby reducing yellowing in the polyearbonate substrate.
公开/授权文献
- US07459211B2 Anti-ultraviolet reflector 公开/授权日:2008-12-02
信息查询