发明申请
US20070037397A1 Two-piece dome with separate RF coils for inductively coupled plasma reactors
失效
具有用于电感耦合等离子体反应器的单独RF线圈的两片式圆顶
- 专利标题： Two-piece dome with separate RF coils for inductively coupled plasma reactors
- 专利标题（中）： 具有用于电感耦合等离子体反应器的单独RF线圈的两片式圆顶
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申请号： US11202043申请日： 2005-08-11
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公开(公告)号： US20070037397A1公开(公告)日： 2007-02-15
- 发明人: Siqing Lu , Qiwei Liang , Canfeng Lai , Robert Chen , Jason Bloking , Irene Chou , Steven Kim , Young Lee , Ellie Yieh
- 申请人： Siqing Lu , Qiwei Liang , Canfeng Lai , Robert Chen , Jason Bloking , Irene Chou , Steven Kim , Young Lee , Ellie Yieh
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： H01L21/302
- IPC分类号： H01L21/302
摘要：
A substrate processing system has a housing that defines a process chamber, a gas-delivery system, a high-density plasma generating system, a substrate holder, and a controller. The housing includes a sidewall and a dome positioned above the sidewall. The dome has physically separated and noncontiguous pieces. The gas-delivery system introduces e a gas into the process chamber through side nozzles positioned between two of the physically separated and noncontiguous pieces of the dome. The high-density plasma generating system is operatively coupled with the process chamber. The substrate holder is disposed within the process chamber and supports a substrate during substrate processing. The controller controls the gas-delivery system and the high-density plasma generating system.