Invention Application
US20070041492A1 X-ray diffraction microscope apparatus and x-ray diffraction measuring method with the x-ray diffraction microscope apparatus 审中-公开
X射线衍射显微镜装置和X射线衍射显微镜装置的X射线衍射测定方法

  • Patent Title: X-ray diffraction microscope apparatus and x-ray diffraction measuring method with the x-ray diffraction microscope apparatus
  • Patent Title (中): X射线衍射显微镜装置和X射线衍射显微镜装置的X射线衍射测定方法
  • Application No.: US10571132
    Application Date: 2004-09-09
  • Publication No.: US20070041492A1
    Publication Date: 2007-02-22
  • Inventor: Kenji SakuraiTazuko Mizusawa
  • Applicant: Kenji SakuraiTazuko Mizusawa
  • Priority: JP2003-318922 20030910
  • International Application: PCT/JP04/13497 WO 20040909
  • Main IPC: G21K7/00
  • IPC: G21K7/00
X-ray diffraction microscope apparatus and x-ray diffraction measuring method with the x-ray diffraction microscope apparatus
Abstract:
An X-ray diffraction microscope apparatus (1) has an X-ray generating apparatus (2), a sample stage (3), a collimator (4) serving to suppress angle divergence, a two-dimensional X-ray detector (5) having an energy resolving power, an image processing apparatus, and an image recording and displaying apparatus (6). An angle divergence of diffracted X-rays is suppressed by moving a sample (7) and the two-dimensional X-ray detector (5) as close as possible via the collimator (4). The diffracted X-rays are measured and imaged in a state in which the two-dimensional X-ray detector (5) and the sample stage (3) are at a standstill without being moved. Accordingly, it is possible to provide an X-ray diffraction microscope apparatus which can acquire an image in an extremely short time, and can image a difference of an inhomogeneous sample, a material in which different crystal structures exist in one sample or a sample in which textures having different directions are contained and an X-ray diffraction measuring method using the X-ray diffraction microscope apparatus.
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