Invention Application
US20070041492A1 X-ray diffraction microscope apparatus and x-ray diffraction measuring method with the x-ray diffraction microscope apparatus
审中-公开
X射线衍射显微镜装置和X射线衍射显微镜装置的X射线衍射测定方法
- Patent Title: X-ray diffraction microscope apparatus and x-ray diffraction measuring method with the x-ray diffraction microscope apparatus
- Patent Title (中): X射线衍射显微镜装置和X射线衍射显微镜装置的X射线衍射测定方法
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Application No.: US10571132Application Date: 2004-09-09
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Publication No.: US20070041492A1Publication Date: 2007-02-22
- Inventor: Kenji Sakurai , Tazuko Mizusawa
- Applicant: Kenji Sakurai , Tazuko Mizusawa
- Priority: JP2003-318922 20030910
- International Application: PCT/JP04/13497 WO 20040909
- Main IPC: G21K7/00
- IPC: G21K7/00

Abstract:
An X-ray diffraction microscope apparatus (1) has an X-ray generating apparatus (2), a sample stage (3), a collimator (4) serving to suppress angle divergence, a two-dimensional X-ray detector (5) having an energy resolving power, an image processing apparatus, and an image recording and displaying apparatus (6). An angle divergence of diffracted X-rays is suppressed by moving a sample (7) and the two-dimensional X-ray detector (5) as close as possible via the collimator (4). The diffracted X-rays are measured and imaged in a state in which the two-dimensional X-ray detector (5) and the sample stage (3) are at a standstill without being moved. Accordingly, it is possible to provide an X-ray diffraction microscope apparatus which can acquire an image in an extremely short time, and can image a difference of an inhomogeneous sample, a material in which different crystal structures exist in one sample or a sample in which textures having different directions are contained and an X-ray diffraction measuring method using the X-ray diffraction microscope apparatus.
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