Invention Application
US20070047414A1 SYSTEM AND METHOD FOR OPTIMIZING WRITE STRATEGY PARAMETERS USING TWO-STAGE ADJUSTMENT 有权
使用两阶段调整优化写策略参数的系统和方法

  • Patent Title: SYSTEM AND METHOD FOR OPTIMIZING WRITE STRATEGY PARAMETERS USING TWO-STAGE ADJUSTMENT
  • Patent Title (中): 使用两阶段调整优化写策略参数的系统和方法
  • Application No.: US11424552
    Application Date: 2006-06-16
  • Publication No.: US20070047414A1
    Publication Date: 2007-03-01
  • Inventor: Chih-Hsiung ChuChih-Ching Yu
  • Applicant: Chih-Hsiung ChuChih-Ching Yu
  • Applicant Address: TW Hsin-Chu
  • Assignee: MEDIATEK INC.
  • Current Assignee: MEDIATEK INC.
  • Current Assignee Address: TW Hsin-Chu
  • Main IPC: G11B7/0045
  • IPC: G11B7/0045
SYSTEM AND METHOD FOR OPTIMIZING WRITE STRATEGY PARAMETERS USING TWO-STAGE ADJUSTMENT
Abstract:
A method for optimizing write parameters using two-stage adjustment is provided. A first kind of write strategy parameters optimization procedure for adjusting at least one static write strategy parameter of a write strategy is performed. A second kind of write strategy parameters optimization procedure for adjusting at least one dynamic write strategy parameter of the write strategy is performed after performing the first kind of write strategy parameters optimization procedure. The static write strategy parameter corresponds to a signal length of a pit on an optical disk and the dynamic write strategy parameter is utilized to overcome heat interference when forming the pit.
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