发明申请
- 专利标题: CERAMIC POLISHING PAD DRESSER AND METHOD FOR FABRICATING THE SAME
- 专利标题(中): 陶瓷抛光垫片及其制作方法
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申请号: US11466716申请日: 2006-08-23
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公开(公告)号: US20070049185A1公开(公告)日: 2007-03-01
- 发明人: Hsiu-Yi Lin , Chou-Chih Tseng , Yu-Tai Chen , Wei Huang
- 申请人: Hsiu-Yi Lin , Chou-Chih Tseng , Yu-Tai Chen , Wei Huang
- 申请人地址: TW Taipei
- 专利权人: KINIK COMPANY
- 当前专利权人: KINIK COMPANY
- 当前专利权人地址: TW Taipei
- 优先权: TW094129005 20050824
- 主分类号: B24B21/18
- IPC分类号: B24B21/18
摘要:
A ceramic polishing pad dresser and the method for fabricating the same are provided. Abrasive particles are adhered onto a ceramic substrate by heating a ceramic powder to be vitrified, thus forming a ceramic diamond disk. Meanwhile, a plastic base is mounted on the bottom of the ceramic diamond disk. As for heating the ceramic powder to be vitrified, the ceramic powder with low melting point is disposed on the ceramic substrate, and to be heated to form a vitrified adhering layer, so as to adhere the abrasive particles disposed thereon to the ceramic substrate. The plastic base mounted on the bottom of the ceramic diamond disk is provided for bearing the ceramic diamond disk and has corresponding screw holes and positioning holes formed thereon for fitting the chemical mechanical polishing table to be mounted and reducing the manufacturing cost.
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