发明申请
US20070052942A1 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
审中-公开
基板输送装置及方法，曝光装置及曝光方法以及装置的制造方法
- 专利标题： Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
- 专利标题（中）： 基板输送装置及方法，曝光装置及曝光方法以及装置的制造方法
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申请号： US11592222申请日： 2006-11-03
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公开(公告)号： US20070052942A1公开(公告)日： 2007-03-08
- 发明人: Nobuyoshi Tanno , Takashi Horiuchi
- 申请人： Nobuyoshi Tanno , Takashi Horiuchi
- 申请人地址： JP Katta-gun JP Tokyo
- 专利权人： ZAO NIKON CO., LTD.,NIKON CORPORATION
- 当前专利权人： ZAO NIKON CO., LTD.,NIKON CORPORATION
- 当前专利权人地址： JP Katta-gun JP Tokyo
- 优先权： JP2003-349549 20031008; JP2003-349552 20031008
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
A substrate transport apparatus, which transports a substrate that has been exposed with an image of a pattern through a projection optical system and a liquid, comprises a substrate support member that supports the substrate, and a liquid removal mechanism that removes the liquid that has adhered to at least one of the substrate support member and at least a portion of the area of the rear surface of the substrate.
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