发明申请
- 专利标题: Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit
- 专利标题(中): 位置测量单元,测量系统和包括该位置测量单元的光刻设备
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申请号: US11226460申请日: 2005-09-15
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公开(公告)号: US20070058172A1公开(公告)日: 2007-03-15
- 发明人: Engelbertus Antonius Van Der Pasch , Erik Loopstra
- 申请人: Engelbertus Antonius Van Der Pasch , Erik Loopstra
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G01B9/02
- IPC分类号: G01B9/02
摘要:
A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a diffraction on a first and a second diffraction grating the position in the first dimension of the second grating with respect to the first grating, The interferometer determines the position in the second dimension of a mirror. The measurement unit includes a combined optical unit to transfer an encoder measurement beam as well as an interferometer measurement beam. Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings may further show some degree of zero order reflection to provide the mirror of the interferometer.
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