发明申请
US20070058415A1 Method for depositing ferroelectric thin films using a mixed oxidant gas
审中-公开
使用混合氧化剂气体沉积铁电薄膜的方法
- 专利标题: Method for depositing ferroelectric thin films using a mixed oxidant gas
- 专利标题(中): 使用混合氧化剂气体沉积铁电薄膜的方法
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申请号: US11520623申请日: 2006-09-14
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公开(公告)号: US20070058415A1公开(公告)日: 2007-03-15
- 发明人: Dong-Hyun Im , Byoung-Jae Bae , Ji-Eun Lim , Dong-Chul Yoo , Yeon-Kyu Jung
- 申请人: Dong-Hyun Im , Byoung-Jae Bae , Ji-Eun Lim , Dong-Chul Yoo , Yeon-Kyu Jung
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR2005-86433 20050915
- 主分类号: G11C11/22
- IPC分类号: G11C11/22
摘要:
Disclosed are methods of forming ferroelectric material layers introducing a plurality of metallorganic source compounds into the reaction chamber, the source compounds being supplied in an appropriate ratio for forming the ferroelectric material. These metallorganic source compounds are, in turn, reacted with a NyOx/O2 oxidant gas mixture in which the NyOxcomponent(s) represents at least 50 volume percent of the oxidant gas. This mixture of metallorganic source compounds and oxidant gas mixture(s) are maintained at a deposition temperature and deposition pressure within the reaction chamber suitable for causing a reaction between the metallorganic source compounds and the oxidant gas for a deposition period sufficient to form the ferroelectric material layer. The resulting ferroelectric material layers exhibit improved uniformity, for example, near the interface with the bottom electrode.
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