Invention Application
- Patent Title: Methods for fabricating nanoscale electrodes and uses thereof
- Patent Title (中): 制造纳米级电极的方法及其用途
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Application No.: US11454638Application Date: 2006-06-16
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Publication No.: US20070059645A1Publication Date: 2007-03-15
- Inventor: Jinyao Tang , Samuel Wind
- Applicant: Jinyao Tang , Samuel Wind
- Applicant Address: US NY New York
- Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee Address: US NY New York
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
The present invention relates to methods for fabricating nanoscale electrodes separated by a nanogap, wherein the gap size may be controlled with high precision using a self-aligning aluminum oxide mask, such that the gap width depends upon the thickness of the aluminum oxide mask. The invention also provides methods for using the nanoscale electrodes.
Public/Granted literature
- US07833904B2 Methods for fabricating nanoscale electrodes and uses thereof Public/Granted day:2010-11-16
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