发明申请
- 专利标题: Iontophoresis device
- 专利标题(中): 离子渗透装置
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申请号: US11501176申请日: 2006-08-07
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公开(公告)号: US20070066931A1公开(公告)日: 2007-03-22
- 发明人: Kiyoshi Kanamura , Takehiko Matsumura , Mizuo Nakayama , Hidero Akiyama , Akihiko Matsumura
- 申请人: Kiyoshi Kanamura , Takehiko Matsumura , Mizuo Nakayama , Hidero Akiyama , Akihiko Matsumura
- 申请人地址: JP Shibuya-ku
- 专利权人: Transcutaneous Technologies Inc.
- 当前专利权人: Transcutaneous Technologies Inc.
- 当前专利权人地址: JP Shibuya-ku
- 优先权: JP2005-229985 20050808
- 主分类号: A61N1/30
- IPC分类号: A61N1/30
摘要:
An iontophoresis device may be capable of preventing or reducing the generation of gas, or the production of undesirable ions, due to an electrode reaction occurring in an electrode assembly; or the alteration of an active agent due to a chemical reaction upon energization. A doping layer made of a substance such as a conductive polymer that effects an electrochemical reaction due to the doping or de-doping of an ion, may be formed in an electrode in an active electrode assembly or counter electrode assembly of an iontophoresis device.
公开/授权文献
- US08295922B2 Iontophoresis device 公开/授权日:2012-10-23
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