- 专利标题: Pressure measuring system for vacuum chamber using ultrasonic wave
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申请号: US11418768申请日: 2006-05-05
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公开(公告)号: US20070068260A1公开(公告)日: 2007-03-29
- 发明人: Seung Hong , Yong Shin , Kwang Chung
- 申请人: Seung Hong , Yong Shin , Kwang Chung
- 申请人地址: KR Daejeon
- 专利权人: Korea Research Institute of Standards and Science
- 当前专利权人: Korea Research Institute of Standards and Science
- 当前专利权人地址: KR Daejeon
- 优先权: KR10-2005-0089163 20050926
- 主分类号: G01L11/00
- IPC分类号: G01L11/00
摘要:
Disclosed is a pressure measuring system for a vacuum chamber, in particular, a pressure measuring system for a vacuum chamber using ultrasonic wave. In this regard, there is provided a pressure measuring system for a vacuum chamber using ultrasonic wave, comprising a vacuum chamber 10 formed with desired vacuum at the inside thereof; ultrasonic wave-emitting means mounted close to an outer peripheral surface of the vacuum chamber 10 for emitting an ultrasonic wave 62 to the inside of the vacuum chamber 10; ultrasonic wave-receiving means for receiving a reflection wave 64 reflected after the striking of the ultrasonic wave 62 emitted from the ultrasonic wave-emitting means to the vacuum chamber; reflection wave-detecting means for detecting the reflection wave 64 from the ultrasonic wave-receiving means; and amplitude-analyzing means for analyzing the amplitude of the reflection wave 64 detected by the reflection wave-detecting means.
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