发明申请
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 光刻设备和器件制造方法
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申请号： US11454129申请日： 2006-06-16
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公开(公告)号： US20070070315A1公开(公告)日： 2007-03-29
- 发明人: Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
- 申请人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
公开/授权文献
- US07751027B2 Lithographic apparatus and device manufacturing method 公开/授权日：2010-07-06
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