An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a substrate to be exposed, via a liquid that is filled in a space between the substrate and a final lens that is closest to the substrate, a movement restricting part for restricting a movement of the liquid by forming a interval between the movement restricting part and the substrate, the interval is smaller than a interval of the space, and a moving part for moving the movement restricting part so that the interval between the movement restricting part and the substrate increases.