Invention Application
- Patent Title: Method for manufacturing a micro-electro-mechanical device
- Patent Title (中): 微机电装置的制造方法
-
Application No.: US11238855Application Date: 2005-09-29
-
Publication No.: US20070072331A1Publication Date: 2007-03-29
- Inventor: Dan Chilcott
- Applicant: Dan Chilcott
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A technique for manufacturing a micro-electro-mechanical (MEM) device includes a number of steps. Initially, a first wafer is provided. Next, a bonding layer is formed on a first surface of the first wafer. Then, a portion of the bonding layer is removed to provide a cavity including a plurality of spaced support pedestals within the cavity. Next, a second wafer is bonded to at least a portion of the bonding layer. A portion of the second wafer provides a diaphragm over the cavity and the support pedestals support the diaphragm during processing. The second wafer is then etched to release the diaphragm from the support pedestals.
Public/Granted literature
- US07534641B2 Method for manufacturing a micro-electro-mechanical device Public/Granted day:2009-05-19
Information query
IPC分类: