Invention Application
- Patent Title: Semiconductor decoupling capacitor
- Patent Title (中): 半导体去耦电容
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Application No.: US11239341Application Date: 2005-09-30
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Publication No.: US20070075341A1Publication Date: 2007-04-05
- Inventor: Meng-An Pan
- Applicant: Meng-An Pan
- Assignee: Broadcom Corporation
- Current Assignee: Broadcom Corporation
- Main IPC: H01L29/80
- IPC: H01L29/80 ; H01L31/112

Abstract:
A semiconductor capacitor that includes a plurality of overlapping conductive layers and a field-effect transistor. The plurality of conductive layers include a first and second conductive layers that are spaced apart to creating a capacitance between the plurality of layers. In the semiconductor capacitor, the FET has a source, a drain and a gate. When the FET is in conduction mode, a capacitance is created between the gate and the conductive path in the semiconductor substrate between the source and the drain. The semiconductor capacitor's total capacitance is increased by coupling the drain and the source to the first conductive layer and coupling the gate to the second conductive layer.
Public/Granted literature
- US07741670B2 Semiconductor decoupling capacitor Public/Granted day:2010-06-22
Information query
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