发明申请
US20070082168A1 High infrared reflection coatings and thin film coating deposition methods 有权
高红外反射涂层和薄膜涂层沉积方法

  • 专利标题: High infrared reflection coatings and thin film coating deposition methods
  • 专利标题(中): 高红外反射涂层和薄膜涂层沉积方法
  • 申请号: US11545212
    申请日: 2006-10-10
  • 公开(公告)号: US20070082168A1
    公开(公告)日: 2007-04-12
  • 发明人: Klaus Hartig
  • 申请人: Klaus Hartig
  • 主分类号: B32B3/02
  • IPC分类号: B32B3/02 B32B17/06
High infrared reflection coatings and thin film coating deposition methods
摘要:
The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.
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