Invention Application
- Patent Title: Lithographic apparatus, device manufacturing method and radiation collector
- Patent Title (中): 光刻设备，器件制造方法和放射线收集器
-
Application No.: US11455943Application Date: 2006-06-20
-
Publication No.: US20070084461A1Publication Date: 2007-04-19
- Inventor: Wilhelmus Box , Harm-Jan Voorma , Olav Frijns , Maurice Arthur Limpens
- Applicant: Wilhelmus Box , Harm-Jan Voorma , Olav Frijns , Maurice Arthur Limpens
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: F24J2/36
- IPC: F24J2/36
Abstract:
A collector is disclosed that is constructed to receive radiation from a radiation source and to transmit radiation to an illumination system, the collector comprising a reflective element which is internally provided with a fluid channel.
Public/Granted literature
- US07470916B2 Lithographic apparatus, device manufacturing method and radiation collector Public/Granted day:2008-12-30
Information query
