Invention Application
- Patent Title: Gas flow measuring apparatus
- Patent Title (中): 气体流量计
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Application No.: US11483549Application Date: 2006-07-11
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Publication No.: US20070089504A1Publication Date: 2007-04-26
- Inventor: Keiji Hanzawa , Satoshi Shimada , Akio Yasukawa , Naoki Saito , Keiichi Nakada , Izumi Watanabe
- Applicant: Keiji Hanzawa , Satoshi Shimada , Akio Yasukawa , Naoki Saito , Keiichi Nakada , Izumi Watanabe
- Priority: JP2005-204620 20050713
- Main IPC: G01F1/68
- IPC: G01F1/68

Abstract:
A gas flow measuring apparatus includes a detecting element including a heating resistor and a thermo-sensitive resistor disposed on a diaphragm and external terminals connected to the heating resistor and the thermo-sensitive resistor, and a flow rate detecting unit which controls heating temperature of the heating resistor and which detects a flow rate of gas according to a change in a resistance value of the heating resistor or the thermo-sensitive resistor. The detecting element includes a resistor area in which the heating resistor and the thermo-sensitive resistor are formed and a fixed section area in which the external terminals are formed. A stress mitigating unit is formed between the resistor area and the fixed section area.
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