发明申请
US20070092732A1 Low k dielectric inorganic/organic hybrid films and method of making
有权
低k介电无机/有机杂化膜及其制备方法
- 专利标题： Low k dielectric inorganic/organic hybrid films and method of making
- 专利标题（中）： 低k介电无机/有机杂化膜及其制备方法
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申请号： US11606425申请日： 2006-11-29
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公开(公告)号： US20070092732A1公开(公告)日： 2007-04-26
- 发明人: Peter Rose , Eugene Lopata , John Felts
- 申请人： Peter Rose , Eugene Lopata , John Felts
- 专利权人： Watkins-Johnson Company, Inc.
- 当前专利权人： Watkins-Johnson Company, Inc.
- 主分类号： B32B9/04
- IPC分类号： B32B9/04
摘要：
A method of depositing a dielectric film exhibiting a low dielectric constant in a semiconductor and/or integrated circuit by chemical vapor deposition (CVD) is provided. The film is deposited using an organosilicon precursor in a manner such that the film is comprised of a backbone made substantially of Si—O—Si or Si—N—Si groups with organic side groups attached to the backbone.
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