发明申请
- 专利标题: Plated film of gold-cobalt amorphous alloy, electroplating bath, and method for electroplating
- 专利标题(中): 金 - 钴非晶合金镀膜,电镀浴,电镀方法
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申请号: US11529537申请日: 2006-09-29
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公开(公告)号: US20070095440A1公开(公告)日: 2007-05-03
- 发明人: Kazutaka Senda , Masaru Kato , Tetsuya Osaka , Yutaka Okinaka
- 申请人: Kazutaka Senda , Masaru Kato , Tetsuya Osaka , Yutaka Okinaka
- 专利权人: Kanto Kagaku Kabushiki Kaisha,WASEDA UNIVERSITY
- 当前专利权人: Kanto Kagaku Kabushiki Kaisha,WASEDA UNIVERSITY
- 优先权: JP2005-286759 20050930
- 主分类号: C22C45/00
- IPC分类号: C22C45/00 ; C22C5/02
摘要:
A gold-cobalt based amorphous alloy plated film consisting of a homogeneous amorphous phase not having microcrystals is formed by electroplating conducted by use of an electroplating bath containing a gold cyanide salt in a concentration of 0.01 to 0.1 mol/dm3 in terms of gold, a cobalt salt in a concentration of 0.02 to 0.2 mol/dm3 in terms of cobalt, and a tungstate in a concentration of 0.1 to 0.5 mol/dm3 in terms of tungsten. The gold-cobalt based amorphous alloy plated film obtained consists of a homogeneous amorphous phase not having microcrystals, and has an enhanced hardness while retaining the good contact resistance and chemical stability intrinsic of gold on such levels as to be free of problems on a practical use basis; therefore, the gold-cobalt based amorphous alloy plated film is effective for use as a contact material in electric and electronic component parts such as relays.
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