发明申请
- 专利标题： Radiation shield for cryogenic pump for high temperature physical vapor deposition
- 专利标题（中）： 用于高温物理气相沉积的低温泵的辐射屏蔽
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申请号： US11267058申请日： 2005-11-04
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公开(公告)号： US20070101733A1公开(公告)日： 2007-05-10
- 发明人: Alan Ritchie
- 申请人： Alan Ritchie
- 主分类号： B01D8/00
- IPC分类号： B01D8/00
摘要：
A method and apparatus to shield a cryogenic pump in a physical vapor deposition chamber comprising a physical vapor deposition chamber, a gasket in thermal contact with the physical vapor deposition chamber, at least one post in contact with the gasket, a radiation shield connected at the top of the post, and at least one intermediate ring in contact with the post. A method and apparatus for a radiation shield for a cryogenic pump comprising a cryogenic pump with a region upstream from the cryogenic pump, a gasket in thermal contact the region upstream from the cryogenic pump, at least one post in contact with the gasket, a radiation shield connected at the top of the post, and at least one intermediate ring in contact with the post.
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