Invention Application
- Patent Title: POSITION MEASURING APPARATUS AND POSITIONAL DEVIATION MEASURING METHOD
- Patent Title (中): 位置测量装置和位置偏差测量方法
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Application No.: US11555397Application Date: 2006-11-01
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Publication No.: US20070103657A1Publication Date: 2007-05-10
- Inventor: Shusuke YOSHITAKE , Shuichi Tamamushi
- Applicant: Shusuke YOSHITAKE , Shuichi Tamamushi
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Priority: JP2005-320299 20051104
- Main IPC: G03B27/68
- IPC: G03B27/68

Abstract:
A position measuring apparatus includes a holder having storage spaces in which a three-point support member for supporting a backside of a substrate being a mask at three points, and a vacuum chuck member for holding a backside of a substrate being a mask are prepared, a stage on which one of the three-point support member and the vacuum chuck member prepared in the storage spaces of the holder is mounted, a vacuum pump to hold and chuck the substrate through the vacuum chuck member in a state of being mounted on the stage, and a recognition unit to recognize a position of a pattern written on the substrate supported by the three-point support member mounted on the stage and a position of a pattern written on the substrate held by the vacuum chuck member on the stage.
Public/Granted literature
- US07643130B2 Position measuring apparatus and positional deviation measuring method Public/Granted day:2010-01-05
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