发明申请
- 专利标题: Method of estimating trap from spectral reflectance factor
- 专利标题(中): 从光谱反射系数估计陷阱的方法
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申请号: US11273227申请日: 2005-11-14
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公开(公告)号: US20070109566A1公开(公告)日: 2007-05-17
- 发明人: Danny Rich
- 申请人: Danny Rich
- 申请人地址: US NJ Parsippany
- 专利权人: Sun Chemical Corporation
- 当前专利权人: Sun Chemical Corporation
- 当前专利权人地址: US NJ Parsippany
- 主分类号: G06F15/00
- IPC分类号: G06F15/00
摘要:
A method of estimating the trap of an overprint of at least two primary colors from the spectral density curve of the overprint by computing the amounts of the two primary colors that will produce a spectral density curve that matches the spectral density curve of the overprint, and then relating the amounts to one another. Also disclosed is a printing method that utilizes the trap estimation method. It is emphasized that this abstract is provided to comply with the rules requiring an abstract which will allow a searcher or other reader quickly to ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the appended issued claims. 37 CFR § 1.72(b).
公开/授权文献
- US07573608B2 Method of estimating trap from spectral reflectance factor 公开/授权日:2009-08-11
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