发明申请
US20070111910A1 Low-irritation compositions and methods of making the same 有权
低刺激性成分及其制造方法

Low-irritation compositions and methods of making the same
摘要:
Provided are compositions comprising low molecular weight polymeric materials and surfactants having reduced irritation associated therewith, methods of reducing the irritation associated with a personal care composition comprising an anionic and/or amphoteric surfactant, the methods comprising combining a low molecular weight polymeric material capable of binding a surfactant thereto with an anionic surfactant to produce a reduced irritation personal care composition, and methods of using such compositions to cleanse the hair or skin with reduced irritation.
公开/授权文献
信息查询
0/0