Invention Application
- Patent Title: Integrated inspection system and defect correction method
- Patent Title (中): 综合检测系统和缺陷校正方法
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Application No.: US11285331Application Date: 2005-11-21
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Publication No.: US20070117225A1Publication Date: 2007-05-24
- Inventor: Kevin Capaldo , Mark Cheverton , Dennis Coyle , Michael Davis , Sameer Talsania , Masako Yamada , Chung-hei Yeung
- Applicant: Kevin Capaldo , Mark Cheverton , Dennis Coyle , Michael Davis , Sameer Talsania , Masako Yamada , Chung-hei Yeung
- Main IPC: H01L21/66
- IPC: H01L21/66

Abstract:
A system for the inspection of and a process for the correction of defects in a microreplicated optical display film manufacturing process. The process steps of manufacturing a master, a plurality of shims from the master, and a multiplicity of display films from each shim are integrated with a systemic defect identification and correction process. Each primary manufacturing step has its own inspection system and correction process where defect information for that step of the process is fed back and analyzed; and from that analysis the subprocess is adjusted to eliminate or reduce the detected defect. The systemic defect is identified as to its source and then fed back and analyzed in the correction step of the respective subprocess in order to cure the root of the defect.
Public/Granted literature
- US07371590B2 Integrated inspection system and defect correction method Public/Granted day:2008-05-13
Information query
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