发明申请
- 专利标题: Plating method and apparatus
- 专利标题(中): 电镀方法和装置
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申请号: US10571751申请日: 2004-09-29
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公开(公告)号: US20070117365A1公开(公告)日: 2007-05-24
- 发明人: Fumio Kuriyama , Rei Kiumi , Nobutoshi Saito , Takashi Takemura , Masaaki Kimura , Sachiko Takeda , Yugang Guo
- 申请人: Fumio Kuriyama , Rei Kiumi , Nobutoshi Saito , Takashi Takemura , Masaaki Kimura , Sachiko Takeda , Yugang Guo
- 申请人地址: JP TOKYO 144-8510
- 专利权人: EBARA CORPORATION
- 当前专利权人: EBARA CORPORATION
- 当前专利权人地址: JP TOKYO 144-8510
- 优先权: JP2003-345062 20031002; JP2004-035594 20040212
- 国际申请: PCT/JP04/14698 WO 20040929
- 主分类号: H01L21/44
- IPC分类号: H01L21/44
摘要:
A plating method comprising applying an ultraviolet ray to a surface of a substrate or exposing a surface of a substrate to an ozone gas or bringing a surface to a substrate into contact with ozone water or bringing a surface of a substrate into contact with electrolytic ionized water or performing a team treatment using steam on a surface of a substrate, and plating the surface of the substrate after said applying, exposing, bringing or performing process. A plating method comprising performing a team treatment using steam on a surface of a substrate, and performing a wet process on the surface of the substrate of a substrate with an acidic plating solution, cleaning the surface of the substrate with pure water and cleaning the surface of the substrate with an alkalescent aqueous solution. A plating apparatus adapted to perform at least one of said methods.
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