发明申请
US20070117825A1 Use of amide derivative of ge 2270 factor a3 for the treatment of acne 有权
使用ge 2270因子a3的酰胺衍生物治疗痤疮

Use of amide derivative of ge 2270 factor a3 for the treatment of acne
摘要:
Use of the compound of formula (I) and the pharmaceutically acceptable addition salts thereof for the manufacture of a medicament for topical treatment or 5 prevention of acne formula (I) wherein: R represents methoxymethyl, R1 represents methyl, Rz represents methyl, Y represents the group formula (II) The compound of formula (I) and the pharmaceutically acid addition salts thereof show selective activity against propionibacterium acne and are suitable for use in a method of treatment or prevention of acne.
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