发明申请
- 专利标题: Semiconductor device manufacturing method
- 专利标题(中): 半导体器件制造方法
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申请号: US11604028申请日: 2006-11-22
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公开(公告)号: US20070123022A1公开(公告)日: 2007-05-31
- 发明人: Takeshi Wakabayashi , Ichiro Mihara
- 申请人: Takeshi Wakabayashi , Ichiro Mihara
- 申请人地址: JP Tokyo
- 专利权人: CASIO COMPUTER CO., LTD.
- 当前专利权人: CASIO COMPUTER CO., LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2005-345613 20051130
- 主分类号: H01L21/44
- IPC分类号: H01L21/44
摘要:
There is prepared a semiconductor construction in which a plurality of columnar electrodes are provided on an upper side of a semiconductor substrate and in which a sealing film is provided on the semiconductor substrate to cover outer peripheral surfaces of the columnar electrodes. Upper sides of the columnar electrodes are removed to form openings in the sealing film on the supper sides of the columnar electrodes. Adhesive coatings are formed on upper surfaces of the columnar electrodes in the openings of the sealing film, Solder balls are provided on upper surfaces of the adhesive coatings. Finally, the solder balls are deformed by a heat treatment to form solder bumps in and above the openings of the sealing film so that the solder bumps are connected to the upper surfaces of the columnar electrodes. Thus, a semiconductor device is manufactured.
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