发明申请
- 专利标题: Semiconductor device and method of manufacturing the same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US11602346申请日: 2006-11-21
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公开(公告)号: US20070126085A1公开(公告)日: 2007-06-07
- 发明人: Masaya Kawano , Koji Soejima , Nobuaki Takahashi , Yoichiro Kurita , Masahiro Komuro , Satoshi Matsui
- 申请人: Masaya Kawano , Koji Soejima , Nobuaki Takahashi , Yoichiro Kurita , Masahiro Komuro , Satoshi Matsui
- 申请人地址: JP Kanagawa
- 专利权人: NEC ELECTRONICS CORPORATION
- 当前专利权人: NEC ELECTRONICS CORPORATION
- 当前专利权人地址: JP Kanagawa
- 优先权: JP2005-349794 20051202
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L21/58
摘要:
A semiconductor device includes an interconnect member, a first semiconductor chip, a second semiconductor chip, a resin layer, an inorganic insulating layer, and a through electrode. The first semiconductor chip is mounted in a face-down manner on the interconnect member. The resin layer covers the side surface of the first semiconductor chip. This inorganic insulating layer is in contact with the back surface of the first semiconductor chip, and directly covers the back surface. Also, the inorganic insulating layer extends over the resin layer. The through electrode penetrates the inorganic insulating layer and the semiconductor substrate of the first semiconductor chip. The second semiconductor chip is mounted in a face-down manner on the inorganic insulating layer that covers the back surface of the first semiconductor chip in the uppermost layer.
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