Invention Application
US20070128090A1 Wet electrostatic liquid film oxidizing reactor apparatus and method for removal of NOx, SOx, mercury, acid droplets, heavy metals and ash particles from a moving gas
审中-公开
湿静电液膜氧化反应器装置和从移动气体中去除NOx，SOx，汞，酸滴，重金属和灰分颗粒的方法
- Patent Title: Wet electrostatic liquid film oxidizing reactor apparatus and method for removal of NOx, SOx, mercury, acid droplets, heavy metals and ash particles from a moving gas
- Patent Title (中): 湿静电液膜氧化反应器装置和从移动气体中去除NOx，SOx，汞，酸滴，重金属和灰分颗粒的方法
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Application No.: US11635465Application Date: 2006-12-06
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Publication No.: US20070128090A1Publication Date: 2007-06-07
- Inventor: Isaac Ray , Mark West , Boris Altshuler
- Applicant: Isaac Ray , Mark West , Boris Altshuler
- Applicant Address: US IL Crystal Lake 60014
- Assignee: Eisenmann Corporation
- Current Assignee: Eisenmann Corporation
- Current Assignee Address: US IL Crystal Lake 60014
- Main IPC: B01D53/56
- IPC: B01D53/56 ; B01J19/08 ; B01J19/12
Abstract:
A method and apparatus for the oxidation of NO, SO2, and mercury vapors and their subsequent removal from a waste gas together with solid submicron particles and acid droplets comprising the reagent injection, WESP/plasma reactor, liquid film catalytic reactor and FGD scrubber with WESP/mist eliminator for the final gas cleaning.
Information query
IPC分类:
