Invention Application
US20070128879A1 Reactive cyclodextrin derivatives as pore-forming templates, and low dielectric materials prepared by using the same
有权
反应性环糊精衍生物作为成孔模板,以及使用其制备的低介电材料
- Patent Title: Reactive cyclodextrin derivatives as pore-forming templates, and low dielectric materials prepared by using the same
- Patent Title (中): 反应性环糊精衍生物作为成孔模板,以及使用其制备的低介电材料
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Application No.: US10588358Application Date: 2004-12-14
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Publication No.: US20070128879A1Publication Date: 2007-06-07
- Inventor: Hee-Woo Rhee , Do Young Yoon , Kook Heon Char , Jin-Kyu Lee , Bongjin Moon , Sung-Kyu Min , SeJung Park , Jae-Jin Shin
- Applicant: Hee-Woo Rhee , Do Young Yoon , Kook Heon Char , Jin-Kyu Lee , Bongjin Moon , Sung-Kyu Min , SeJung Park , Jae-Jin Shin
- Applicant Address: KR SEOUL 121-742
- Assignee: INDUSTRY-UNIVERSITY CORPORATION FOUNDATION SOGANG UNIVERSITY
- Current Assignee: INDUSTRY-UNIVERSITY CORPORATION FOUNDATION SOGANG UNIVERSITY
- Current Assignee Address: KR SEOUL 121-742
- Priority: KR10-2004-0010827 20040218
- International Application: PCT/KR04/03287 WO 20041214
- Main IPC: H01L23/58
- IPC: H01L23/58 ; H01L21/31

Abstract:
This invention is related to a reactive nanoparticular cyclodextrin derivative useful as a porogen and a low dielectric matrix, with excellent mechanical properties and uniformly distributed nanopores, manufactured by sol-gel reaction of the above reactive cyclodextrin. Furthemore, this invention also is related to an ultralow dielectric film, with uniformly distributed nanopores, a relatively high porosity of 51%, and a relatively low dielectric constant of 1.6, manufactured by thin-filming of the conventional organic or inorganic silicate precursor by using the above reactive cyclodextrin as a porogen.
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