发明申请
US20070128879A1 Reactive cyclodextrin derivatives as pore-forming templates, and low dielectric materials prepared by using the same
有权
反应性环糊精衍生物作为成孔模板,以及使用其制备的低介电材料
- 专利标题: Reactive cyclodextrin derivatives as pore-forming templates, and low dielectric materials prepared by using the same
- 专利标题(中): 反应性环糊精衍生物作为成孔模板,以及使用其制备的低介电材料
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申请号: US10588358申请日: 2004-12-14
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公开(公告)号: US20070128879A1公开(公告)日: 2007-06-07
- 发明人: Hee-Woo Rhee , Do Young Yoon , Kook Heon Char , Jin-Kyu Lee , Bongjin Moon , Sung-Kyu Min , SeJung Park , Jae-Jin Shin
- 申请人: Hee-Woo Rhee , Do Young Yoon , Kook Heon Char , Jin-Kyu Lee , Bongjin Moon , Sung-Kyu Min , SeJung Park , Jae-Jin Shin
- 申请人地址: KR SEOUL 121-742
- 专利权人: INDUSTRY-UNIVERSITY CORPORATION FOUNDATION SOGANG UNIVERSITY
- 当前专利权人: INDUSTRY-UNIVERSITY CORPORATION FOUNDATION SOGANG UNIVERSITY
- 当前专利权人地址: KR SEOUL 121-742
- 优先权: KR10-2004-0010827 20040218
- 国际申请: PCT/KR04/03287 WO 20041214
- 主分类号: H01L23/58
- IPC分类号: H01L23/58 ; H01L21/31
摘要:
This invention is related to a reactive nanoparticular cyclodextrin derivative useful as a porogen and a low dielectric matrix, with excellent mechanical properties and uniformly distributed nanopores, manufactured by sol-gel reaction of the above reactive cyclodextrin. Furthemore, this invention also is related to an ultralow dielectric film, with uniformly distributed nanopores, a relatively high porosity of 51%, and a relatively low dielectric constant of 1.6, manufactured by thin-filming of the conventional organic or inorganic silicate precursor by using the above reactive cyclodextrin as a porogen.
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