发明申请
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US11482119申请日： 2006-07-07
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公开(公告)号： US20070132971A1公开(公告)日： 2007-06-14
- 发明人: Timotheus Sengers , Marcus Adrianus Kerkhof , Mark Kroon , Kees Weert
- 申请人： Timotheus Sengers , Marcus Adrianus Kerkhof , Mark Kroon , Kees Weert
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EPEP03255395.0 20030829
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
公开/授权文献
- US08035798B2 Lithographic apparatus and device manufacturing method 公开/授权日：2011-10-11
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